Direct-Write Electron-Beam Lithography Fabrication for Organic Thin Film Transistors

Joshua LePore, Bongmook Lee

Electrical Engineering Technology, College of Engineering, SUNY Polytechnic Institute, Utica, NY, USA

Organic thin film transistors are a bendable and durable transistor with numerous ways to fabricate. These ways of fabricating the Transistors come with drawbacks and advantages. One way of fabricating them is through Direct – Write Electron – Beam Lithography. This fabrication method allows for sub-micrometer on/off current ratios and mV sub threshold swings which are the first ever in a organic thin film transistor.